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A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)

Received: 2 May 2013     Published: 10 July 2013
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Abstract

The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.

Published in American Journal of Nanoscience and Nanotechnology (Volume 1, Issue 2)
DOI 10.11648/j.nano.20130102.11
Page(s) 46-51
Creative Commons

This is an Open Access article, distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution and reproduction in any medium or format, provided the original work is properly cited.

Copyright

Copyright © The Author(s), 2013. Published by Science Publishing Group

Keywords

Nanomanufactiring, FIB, Metal Organic Gas, Outline Features, Precursor Flux

References
[1] Marc J. Madou, Fundamentals of microfabrication – the science of miniaturization, CRC Press, Second eddition
[2] Edward L. Wolf, Nanophysics and nanotechnology: An introduction to modern concepts in nanoscience, Physics textbook, WILEY-VCH
[3] Michael Rieth, Nano-engineering in science and technology: an introduction to the world of nano design, World scientific, Vol. 6
[4] Stanley Humphries, Jr., Charged particle beams, Originally published in1990 by John Wiley and Sons (QC786.H86 1990, ISBN 0-471-60014-8)
[5] John Melngailis, Focused ion beam fabrication of microelectronic structures, Final report – U.S. Army Research office Contract DAALO3-87-K-0126, Research Laboratory of Electronics Massachusetts Institute of Technology
[6] Fabio Cicoira, Electron beam induced deposition of rhodium Nanostructures, École Polytechnique Fédérale De Lausanne, Thèse No 2528 (2002)
[7] Yongqi Fu, Ngoi Kok, Ann Bryan, Ong Nan Shing, Characterization of focused ion beam induced deposition process and parameters calibration, Elsevier Sensors and actuators A 88 (2001) 58-66
[8] Joon Hyun Kim, Youn-Jea Kim, Influence of stage control parameters on pattering in the focused ion beam deposition process, Journal of the Korean Physical Society, Vol. 53, (Nov. 2008), 2596-2602
[9] B. W. Kemshall, L. A. Giannuzzi, B. I. Prenitzer, F. A. Stevie, S. X. Da, Comparative evaluation of protective coatings and focused ion beam chemical vapor deposition process, Journal of the American Vacuum Society, B20(1), Jan/Feb 2002, 286-290
[10] Jack Zhou, Guoliang Yang, Focused ion beam based nanohole modeling, simulation, fabrication, and application, Journal of manufacturing science and engineering, Vol. 132, Feb 2010, 011005-1 to 011005-8 (Transactions of the ASME)
[11] Jerome J. Cuomo, Stephen M. Rossnagel, Harold R. Kaufman, Handbook of ion beam processing technology – principles, deposition, film modification and synthesis, Noyes publications
[12] Ivo Utke, Pattrick Hoffmann, John Melngailis, Gas-assisted focused electron beam and ion beam processing and fabrication, J. Vac. Sci. Technol. B, Vol. 26, No. 4, Jul/Aug 2008, 1197-1276
[13] Francis L. Ross III, Nano-cellural microstrtucture evolution in ion induced chemical vapour deposition (II-CVD) of copper, Submitted to the department of material science and engineering in fulfillment of the requirement of the degree Doctor of Philosophy at the, Massachusetts Institute of Technology, Sep. 2003
[14] Jon Orloff, Handbook of charged particle optics, second edition, CRC Press
[15] Edited by: Bernhard Wolf , Handbook of Ion sources, CRC
Cite This Article
  • APA Style

    Wasim Haskiya. (2013). A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). American Journal of Nano Research and Applications, 1(2), 46-51. https://doi.org/10.11648/j.nano.20130102.11

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    ACS Style

    Wasim Haskiya. A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). Am. J. Nano Res. Appl. 2013, 1(2), 46-51. doi: 10.11648/j.nano.20130102.11

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    AMA Style

    Wasim Haskiya. A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD). Am J Nano Res Appl. 2013;1(2):46-51. doi: 10.11648/j.nano.20130102.11

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  • @article{10.11648/j.nano.20130102.11,
      author = {Wasim Haskiya},
      title = {A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)},
      journal = {American Journal of Nano Research and Applications},
      volume = {1},
      number = {2},
      pages = {46-51},
      doi = {10.11648/j.nano.20130102.11},
      url = {https://doi.org/10.11648/j.nano.20130102.11},
      eprint = {https://article.sciencepublishinggroup.com/pdf/10.11648.j.nano.20130102.11},
      abstract = {The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.},
     year = {2013}
    }
    

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  • TY  - JOUR
    T1  - A Novel Nanofabrication Technique Using Focused Ion Beam (FIB), Metal Organic Chemical Vapour Deposition (MOCVD)
    AU  - Wasim Haskiya
    Y1  - 2013/07/10
    PY  - 2013
    N1  - https://doi.org/10.11648/j.nano.20130102.11
    DO  - 10.11648/j.nano.20130102.11
    T2  - American Journal of Nano Research and Applications
    JF  - American Journal of Nano Research and Applications
    JO  - American Journal of Nano Research and Applications
    SP  - 46
    EP  - 51
    PB  - Science Publishing Group
    SN  - 2575-3738
    UR  - https://doi.org/10.11648/j.nano.20130102.11
    AB  - The aim of this paper is to present a novel nano-manufacturing technique for the fabrication of nano-scale systems, such as mechanical machines and printed circuits etc. The proposed technique utilizes a guided focused ion beam (FIB) through a pattern to a substrate where it decomposes a metal organic gas to generate a reduced outline copy of the mask, yielding the required design system. The novelty of this technique is in the ability to fabricate nano-scale systems layer-by-layer rather than atom-by-atom through the adjustment of the vertical position of the fabricated part.To demonstrate the proposed technique, a simulation model was designed and tested. The simulation results have shown that a reduction in the perimeter of the fabricated part can be achieved easily by adjusting its vertical position with respect to the beam focused point by a 100 to 400 times. Further investigation revealed that the growth rate is a function of the precursor flux. For example, using a titanium precursor flux below the 2x1010 molecules/cm2.s then sputtering is more predominant, and above that value, a net deposition will occur at a growth rate of 5.3x10-05cm/s.
    VL  - 1
    IS  - 2
    ER  - 

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  • Irish Robotics Academy, Ireland

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